发明名称 |
IMPROVED STEREOLITHOGRAPHY SYSTEM |
摘要 |
A stereolithography system comprises an emitting device and a tank disposed above the emitting device. The tank has a first optically transparent bottom wall and a second optically transparent bottom wall with a space disposed therebetween. There is a linear stage that extends away from the tank and a carrier platform is moveable along the linear stage away from the tank. There is also a wettable material at a bottom wall of the tank within the tank. A fluid cooling system is in fluid communication the space disposed between the first optically transparent bottom wall of the tank and the second optically transparent bottom wall of the tank. |
申请公布号 |
WO2016172805(A1) |
申请公布日期 |
2016.11.03 |
申请号 |
WO2016CA50509 |
申请日期 |
2016.05.02 |
申请人 |
CASTANON, Diego;FORTIER, Raymond |
发明人 |
CASTANON, Diego |
分类号 |
G03F7/20;B33Y30/00;B82Y30/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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