发明名称 PRODUCTION OF PURE PHENYLENEDIOXYDIACETIC ACIDS
摘要 PROBLEM TO BE SOLVED: To obtain the subject compound in a high purity and a high yield, by subjecting a specific amount of an alkaline acqueous solution of crude phenylenedioxydiacetic acids, to an acid dipping at a specific temperature, and thereafter, by thermal insulation thereof at a specific temperature. SOLUTION: This compound is obtained by subjecting >=10 wt.% of an alkaline acqueous solution of a crude phenylenedioxydiacetic acid consisting mainly of a phenylenedioxydiacetic acid of formula I (R is a halogen, carboxyl or a <=4C hydrocarbon; n is 0-3), namely containing pref. about >=80 wt.%, more pref. about >=90 wt.%, calculated as solid content, to acid dipping at a temp. of 0 to 50 deg.C, using a mineral acid, and thereafter, by thermal insulation thereof at a temp. of 80 to 110 deg.C. The alkaline acqeous solution of the crude phenylenedioxydiacetic acid can be obtained, for example, by etherification of a dihydroxybenzene of formula II (e.g. resorcinol) with a haloacetic acid (e.g. monochloroacetic acid) in an alkaline acqueous solution (e.g. an acqueous sodium hydroxide solution).
申请公布号 JP2000290228(A) 申请公布日期 2000.10.17
申请号 JP19990282619 申请日期 1999.10.04
申请人 SUMITOMO CHEM CO LTD 发明人 MORIMOTO JUNJI;KAMIKAWA TAKU;UEDA HIROSHI
分类号 C07C59/70;C07C51/353;C07C51/367;C07C51/43;C07C51/48;(IPC1-7):C07C59/70 主分类号 C07C59/70
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