| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent cracks in a transparent conductive film due to the influence of a transparent resin film in a liquid crystal display device having such an array structure that the transparent resin film is formed on a TFT and further the transparent conductive film is formed as an electrode. SOLUTION: In order to prevent cracks in the transparent conductive film 13, the film thickness of the transparent resin film is specified to <=3μm, and to prevent display failure (crosstalk failure), a photosensitive acrylic resin is used for the transparent resin film 12 and is formed to >=1.5μm thickness. By this method, since cracks in the transparent conductive film can be prevented and crosstalk failure can be prevented, the production yield in the array process is significantly improved.</p> |
