| 摘要 |
PROBLEM TO BE SOLVED: To enhance throughput by a method wherein there is provided control means for stage move without stopping up to a receiving position when an exposure is ended in a final exposure region out of a plurality of exposure amount regions. SOLUTION: At a point of time when a scanning exposure in an exposure region one region before a final exposure amount region is completed, in a scan exposure of the final exposure amount region, a processing circuit 35 judges that a substrate exchange position is at one side in a Y direction, and a start position of the scan exposure is at a plus side in the Y direction. A mask stage 23 and a substrate stage 28 move to the plus side in the Y direction. Thereafter, the mask stage 23 and the substrate stage 28 make scanning exposure operations. The scanning exposure is made until the entire face of patterns on a mask 1 is exposed to a substrate 2. Thereafter, the processing circuit 35 accelerates and decelerates, while the substrate stage 28 is controlled to move to the substrate exchange position. Thus, it is possible to enhance the throughput of a scanning aligner and improve productivity. |
