发明名称 PREPARATION FOR EXTERNAL USE FOR SKIN OF PHOTOSTRESS
摘要 PROBLEM TO BE SOLVED: To obtain a preparation for external use for skin that can alleviate the undesirable actions caused by ultraviolet rays subacutely or chronically and is useful as a cosmetic or a medicine for external use for skin. SOLUTION: This preparation for external use against photostress to skin includes one or two or more selected from mucosaccharides bearing sulfate groups and one or two or more selected fromα-hydroxy acids, ursolic acid and its derivatives, and oleanolic acid and its derivatives. The mucopolysaccharide bearing sulfate groups desirably contains a heparin-like substance, while theα-hydroxy acids, ursolic acid and its derivatives, and oleanolic acid and its derivatives are preferably selected from glycolic acid, lactic acid, ursolic acid, alkyl ursolates, alkenyl ursolates, benzyl ursolate, oleanolic acid, alkyl oleanolates, alkenyl oleanolates, benzyl olanolate and their physiologically acceptable salts.
申请公布号 JP2000302659(A) 申请公布日期 2000.10.31
申请号 JP19990111641 申请日期 1999.04.20
申请人 POLA CHEM IND INC 发明人 TAKATORI MASAHARU
分类号 A61K8/30;A61K8/00;A61K8/36;A61K8/365;A61K8/60;A61K8/72;A61K8/73;A61Q19/00;(IPC1-7):A61K7/48;A61K7/00 主分类号 A61K8/30
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