发明名称 TREATMENT OF SILICON WAFER
摘要 <p>PROBLEM TO BE SOLVED: To pick up a silicon wafer fixed on a pedestal after the wafer is worked by sandblasting, without damaging the workability and work environment and in addition, to recover the pedestal after picking up the wafer without damaging the workability and work environment. SOLUTION: In a method for treating silicon wafer, a silicon wafer 11 fixed on a pedestal 12 is picked up, after the wafer is worked to a prescribed pattern by sandblasting. At fixing the wafer 11 on the pedestal 12, a double-coated adhesive sheet 10 is used as a means for fixing the wafer 11 on the pedestal 12 and is removed from the pedestal 12, after the wafer 11 is picked up.</p>
申请公布号 JP2000331965(A) 申请公布日期 2000.11.30
申请号 JP19990142437 申请日期 1999.05.21
申请人 NITTO DENKO CORP 发明人 YAMAMOTO MASAYUKI;MIKI KAZUYUKI;NAMIKAWA AKIRA
分类号 B24C1/04;H01L21/301;H01L21/68;H01L21/683;(IPC1-7):H01L21/301 主分类号 B24C1/04
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