发明名称 THIN FILM TRANSISTOR PANEL AND MANUFACTURING METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide a thin film transistor panel and a manufacturing method thereof permitting good connections. SOLUTION: This TFT panel is completed by patterning a protective insulating film 17 by means of the photo-lithography method, and forming contact hole 17a corresponding to a source electrode S of TFT 30 and apertures 17b, 17c corresponding to data line terminal area DLa, and gate line terminal area GLa, and forming an aperture 12a corresponding to the above-mentioned gate line terminal area GLa also to a gate insulating film 12, and patterning a transparent conductive film 18 in the form of the upper layer film of a pixel electrode 20, a data line terminal area DLa, and a gate line terminal area GLa by means of the photo-lithography method after depositing the transparent conductive film 18 like an ITO film, etc.</p>
申请公布号 JP2001033826(A) 申请公布日期 2001.02.09
申请号 JP20000171800 申请日期 2000.06.08
申请人 CASIO COMPUT CO LTD 发明人 MATSUDA KUNIHIRO
分类号 G02F1/1345;G02F1/136;G02F1/1368;G09F9/30;H01L21/336;H01L29/786;(IPC1-7):G02F1/136;G02F1/134 主分类号 G02F1/1345
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