发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND CONTROLLING METHOD OF LEAD FRAME FOR SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent a soldering failure from occurring between a lead frame of Cu or Cu alloy and a semiconductor element so as to improve a semiconductor device in yield. SOLUTION: In a method for manufacturing a semiconductor device in which a semiconductor element is soldered on the surface of a lead frame of Cu or Cu alloy, the thickness of an oxide film on the surface of the lead frame is measured before a soldering process, and when the oxide film is not as thick as required, the lead frame is heated in a reducing atmosphere so as to make an oxide film located on its surface as thick as required, and then a soldering operation is carried out when the oxide film gets as thick as required.</p>
申请公布号 JP2001160610(A) 申请公布日期 2001.06.12
申请号 JP19990343343 申请日期 1999.12.02
申请人 HITACHI LTD 发明人 ITO KAZUTOSHI;OHASHI TAKEYA;HATORI KAZUO
分类号 H01L23/50;(IPC1-7):H01L23/50 主分类号 H01L23/50
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