发明名称 METHOD FOR GROWING SiC MONOCRYSTALS
摘要 A method is described for growing at least one silicon carbide (SiC) single crystal by sublimation of a SiC source material. Silicon, carbon and a SiC seed crystal are introduced into a growing chamber. Then, the SiC source material is produced from the silicon and the carbon in a synthesis step that takes place before the actual growing. The growing of the SiC single crystal is then carried out immediately after the synthesis step. The carbon used is a C powder with a mean grain diameter of greater than 10 mum.
申请公布号 EP1105555(A1) 申请公布日期 2001.06.13
申请号 EP19990942774 申请日期 1999.07.01
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 STEIN, RENE;KUHN, HARALD;VOELKL, JOHANNES
分类号 C30B29/36;C30B23/00 主分类号 C30B29/36
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