| 摘要 |
<p>A method and apparatus for the flame hydrolysis deposition (FHD) of a core material on a substrate provides a holder for a substrate which is heated to a predetermined temperature selected to maintain the substrate temperature relatively constant during the FHD process. As a result, the thickness of a thin film applied to the substrate is uniform as is the index of refraction of the core material deposited on the substrate. A chuck (80, 100) for receiving a disk-shaped substrate is supplied with an embedded electrical heater (88) or a gas heater (110) positioned on a side of the chuck (100) opposite the substrate mounting for maintaining the chuck temperature at from about 700 °C to 900 °C. The chuck is rotated with respect to a line-flame burner which introduces a vaporized mixture of organometallic material into the burner for depositing a thin film of from about 5 to 6.5 microns of doped glass on the substrate.</p> |
