SUBSTRATE HOLDING FITTING FOR HEAT TREATMENT, SUBSTRATE HEAT TREATMENT APPARATUS, AND METHOD FOR THERMALLY TREATING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To manufacture a vertical boat for heat treatment which can avoid generation of a surface defect called a slip in heat treatment steps of semiconductor substrate (silicon wafer) oxidization, CVD, annealing, etc. SOLUTION: A vertical heat treatment boat 1 is obtained by polishing a silicon wafer support part to a grain particle roughness of #800 or more, chamfering and then annealing it. Or two or more smooth projections are provided to the support part. Further, the vertical heat treatment boat is manufactured vertically symmetrically.