SCANNING EXPOSURE METHOD AND SCANNING EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To smoothly connect adjacent patterns to each other in a synchronous moving direction when synthesizing screens by connecting the patterns on a substrate by synchronously moving a mask and the substrate. SOLUTION: In the scanning exposure method for exposing the first pattern and the second pattern to the substrate P by synchronously moving the mask R having the first pattern and the second pattern and the substrate P, part of the first pattern and part of the second pattern are exposed in overlap in exposing the first pattern and the second pattern along the synchronous moving direction of the substrate P and the synchronous moving speeds of the mask R and the substrate P in executing the overlap exposure are varied from the synchronous moving speeds of the mask R the substrate P and when the overlap exposure is not carried out.