发明名称 OPTICAL SYSTEM AND LASER IRRADIATING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To reduce the aberration of a spherical lens and to uniformize the energy distribution of a linear laser. SOLUTION: The cylindrical lens is divided by the plane parallel to the generatrix and the optical axis. By changing the height from the irradiated surface of the divided individual lens, the difference in the focal length in the lens is corrected to decrease the aberration. The energy distribution of the linear laser thereby becomes uniform. The method is used also not only as the linear laser optical system but as a method of reducing the aberrations of the lens.</p>
申请公布号 JP2001242413(A) 申请公布日期 2001.09.07
申请号 JP20000052853 申请日期 2000.02.29
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 TANAKA KOICHIRO
分类号 G02F1/136;G02B3/06;G02B3/08;G02B27/09;G02F1/1368;H01L21/20;H01L21/268;H01L21/336;H01L29/786;(IPC1-7):G02B27/09 主分类号 G02F1/136
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