发明名称 Method for manufacturing dislocation-free silicon single crystal
摘要 A method for manufacturing a dislocation-free silicon single crystal, includes the steps of preparing a silicon seed crystal formed of a dislocation-free single crystal having a boron concentration of 1x1018 atoms/cm3 or more, preparing a silicon melt having a boron concentration which differs from that of the seed crystal by 7x1018 atoms/cm3 or less, and bringing the seed crystal into contact with the silicon melt to grow the silicon single crystal.
申请公布号 US2001020438(A1) 申请公布日期 2001.09.13
申请号 US20010767225 申请日期 2001.01.23
申请人 PRESIDENT OF SHINSHU UNIVERSITY 发明人 HOSHIKAWA KEIGO;HUANG XINMING;FUKAMI TATSUO;TAISHI TOSHINORI
分类号 C30B29/06;C30B13/00;C30B13/34;C30B15/00;C30B15/36;(IPC1-7):C30B15/00;C30B21/06;C30B27/02;C30B28/10;C30B30/04 主分类号 C30B29/06
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