| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method which can manufacture a poly crystalline silicon TFT array substrate high in reliability without generating defective displays, such as point defect by preventing the deviation of patterning resulting from thermal expansion or shrinkage of a glass substrate. SOLUTION: In the manufacturing method of the TFT array substrate, deformations of the glass substrate generated in a heat treatment process, such as the thermal shrinkage or the thermal expansion, are estimated previously, a pattern size is magnified or reduced only for the deformation previously estimated before the heat treatment process, and exposure and the patterning are performed. Then, the following patterning is performed according to the pattern formed before, after heat treatment.</p> |
