发明名称 MANUFACTURING METHOD OF ELECTRON SOURCE SUBSTRATE AND ELECTRON SOURCE SUBSTRATE MANUFACTURED BY THE METHOD AND IMAGE DISPLAY DEVICE USING THE SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide an electron source substrate by forming an accurate and high quality electron emission element and to provide a high quality image display device by using the same. SOLUTION: Plural pair of element electrodes are arranged on a substrate and a solution containing conductive thin film material is jetted between every element electrodes from a jet head to form a surface conductive type electrode emission element group. An element of the surface conductive type element group is formed by jetting plural solution drops in a dot image as illustrated. Every adjacent dots overlap each other and distances between centers of adjacent dots in two directions crossing at right angles are maintained less than or equal to 1/√2 times of a diameter of a dot. A substrate is not exposed and an accurate electron emission element is formed under this condition.</p>
申请公布号 JP2001307622(A) 申请公布日期 2001.11.02
申请号 JP20000124813 申请日期 2000.04.25
申请人 RICOH CO LTD 发明人 SEKIYA TAKURO
分类号 H01J9/02;H01J1/316;H01J29/04;H01J31/12;(IPC1-7):H01J9/02 主分类号 H01J9/02
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