| 摘要 |
PROBLEM TO BE SOLVED: To attain a method and system for forming a deposited film having excellent productivity, by which the deposited film can be formed at a low cost with high efficiency without deteriorating the characteristics of the deposed film. SOLUTION: The deposited-film-forming system is constituted of: a movable reaction vessel section 101 in which a reaction vessel 104, etc., are fixed on a reaction-vessel-supporting stand 106 which is movably supported by casters 105; an exhaust section 102 to which the reaction vessel section 101 is detachably connected; and a vibrating means for vibrating the section 101 disengaged from the exhaust section 102 in a reaction-vessel-vibrating area 112. After the dust adhering to the inner surface of the reaction vessel 104 and the members in the reaction vessel 104 is previously eliminated by vibrating the reaction vessel 104 in the vibrating area 112, a cylindrical substrate to be subjected to film deposition is set up in the reaction vessel 104 in a feeding area 113. By this procedure, the adhesion of dust to the cylindrical substrate can be prevented.
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