发明名称 METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical waveguide substrate which prevents the intrusion of impurities into an optical waveguide substrate to be manufactured by a steam oxidation method having high safety and can thickly oxidize the surface of silicon by suppressing the consumption of energy to a lower level. SOLUTION: In the method for manufacturing the optical waveguide substrate by forming a quartz glass film on the heated silicon 1 by exposing the silicon to steam and oxidizing the silicon, the steam generated by causing the molecular vibration of continuously replenished pure water of about room temperature at the highest by microwaves is supplied to the silicon.
申请公布号 JP2001330748(A) 申请公布日期 2001.11.30
申请号 JP20010073477 申请日期 2001.03.15
申请人 SHIN ETSU CHEM CO LTD;SHINETSU ENGINEERING KK 发明人 MAKIKAWA SHINJI;SHIROTA MASAAKI;EJIMA MASAKI;AOI HIROSHI;ONODA TADAYOSHI
分类号 G02B6/13;C03B8/04;C03B19/14;C03B20/00;(IPC1-7):G02B6/13 主分类号 G02B6/13
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