| 摘要 |
Disclosed is an exposure apparatus for exposing a substrate with a pattern of a mask, wherein polarized light from a light source is transformed into light having its polarization state, in a section perpendicular to an optical axis, changed, wherein the light is divided with respect to a wavefront into plural light beams which are then superposed one upon another on a light entrance surface of an optical integrator, and wherein the mask is illuminated with light beams from the optical integrator.
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