发明名称 METHOD FOR TREATING USED HEAT DEVELOPABLE MATERIAL
摘要 <p>PROBLEM TO BE SOLVED: To rapidly recover a base and silver from a heat developable material in high yields and to obtain an original starting material in a high yield by separating a coating on the PET base of a heat developable material and converting the PET to a supercritical fluid. SOLUTION: In the method for treating a used heat developable material containing photosensitive silver halide grains, an organic silver salt, a reducing agent and a binder on the base, the base is separated from the heat developable material by a method comprising 1 a step for cutting the heat developable material into chips of 0.1 mm2 to 100 cm2 width (expressed in terms of area), 2 a step for immersing the chips in acidic or alkaline water containing an oxidizing agent at 60-140 deg.C to remove a coating from the base within 1 min to 8 hr, 3 a step for separating the base from the coating with a filter and 4 a step for drying the separated base with hot air at 40-100 deg.C.</p>
申请公布号 JP2002031872(A) 申请公布日期 2002.01.31
申请号 JP20000217501 申请日期 2000.07.18
申请人 KONICA CORP 发明人 HANIYU TAKESHI;NISHIWAKI SHU;MITSUHASHI TAKESHI
分类号 G03C5/00;B01D11/00;B01D21/01;B09B3/00;B09B5/00;B29B17/00;B29B17/04;C02F1/56;G03C1/498;G03C11/24;(IPC1-7):G03C1/498 主分类号 G03C5/00
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