发明名称 SUBSTRATE PROCESSING DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PURPOSE: To prevent the occurrence of erroneous transfer of wafers due to individual difference of boats. CONSTITUTION: In a CVD device in which a first boat 21A and a second boat 21B are used, an existence detecting part 73 and an detecting part 74 for distinguishing in a boat distinguishing detector 72 of a boat distinguishing means are provided on the upper surface of a standby table, on which a transfer work of wafers to a boat is executed by a wafer transfer device with the boats placed. Detected elements 79 and 79 which correspond to the existence detecting part 73 and the detecting part 74 for distinguishing are provided so as to protrude on the first boat 21A, and only the detected element 79 which corresponds to the existence detecting part 73 is provided so as to protrude on the second boat 21B. When the both detected elements 79 and 79 are detected by the boat detecting device 72, the boat is judged to be the first boat 21A, and when only one of the detected elements 79 is detected, the boat is judged to be the second boat 21B. Thus, since the wafer transfer device can be controlled under conditions depending on the individual difference of the boats by distinguishing between the first and second boats, the erroneous transfer of wafers can be prevented.
申请公布号 KR20020010109(A) 申请公布日期 2002.02.02
申请号 KR20010045646 申请日期 2001.07.27
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 MORIMITSU KAZUHIRO;ODAKE SHIGERU;YANAGAWA HIDEHIRO
分类号 C23C16/44;B66F3/08;C23C16/52;C23C16/54;H01L21/00;H01L21/205;H01L21/22;H01L21/31;H01L21/324;H01L21/677;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 C23C16/44
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