发明名称 POLYESTER SUBSTRATE AND SILVER HALIDE PHOTOGRAPHIC PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a polyester substrate capable of giving a silver halide photographic photosensitive material excellent in film cutting smoothness in a processing laboratory and notch openability and also adhesion and curling property, and to provide such a silver halide photographic photosensitive material having the substrate. SOLUTION: This polyester substrate consists of a polyester 0.3-0.5 dl/g in intrinsic viscosity, being such as to be subjected to glow discharge treatment in a gaseous atmosphere meeting the requirements (1) and (2) described below: (1) the weight fraction of nitrogen and water totals 80-90%, and (2) the weight ratio of nitrogen to water is >=5. The other objective silver halide photographic photosensitive material using the above substrate is provided.
申请公布号 JP2002053685(A) 申请公布日期 2002.02.19
申请号 JP20000240082 申请日期 2000.08.08
申请人 FUJI PHOTO FILM CO LTD 发明人 KAWASAKI HIROSHI
分类号 G03C1/795;C08G63/189;C08J5/18;C08J7/00;(IPC1-7):C08J7/00 主分类号 G03C1/795
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