METHOD OF FORMING WIRING HAVING CHROMIUM LAYER

摘要

PROBLEM TO BE SOLVED: To make the surface deterioration layer, etc., of a resist pattern which occurs when forming chrominum wiring by wet etching removable without using any exclusively used device. SOLUTION: The chromium wiring is formed by carrying an object having the resist pattern on a chromium layer formed on a substrate in a chromium wet-etching section 23 and wet-etching the chromium layer with a mixed acid containing secondary ammonium cerium nitrate and perchloric acid by using the resist pattern as a mask. Then the object is carried in a post-treating section 24 and the surface deterioration layer, etc., of the resist pattern is removed by performing post treatment on the object by using a mixed acid containing nitric acid, acetic acid, and phosphoric acid. After post treatment, the object is carried in a resist stripping-off section 33 and the resist pattern in stripped off by performing wet-etching by using a resist stripper containing amine.