| 摘要 |
PURPOSE: A bake apparatus for semiconductor manufacture is provided to allow the elimination of fumes outgassed from a wafer during a hard bake before coating of photoresist. CONSTITUTION: A plate(10) on which the wafer is placed is formed in a chamber(12), and a cover(14) is located above the plate(10). Furthermore, supporting members(18) are interposed between the cover(14) and the plate(10) so as to support the wafer. The cover(14) has a plurality of exhaust holes(16) for drawing out fumes. In particular, the cover(14) is connected to an exhaust line(20), which allows eliminating the fumes outgassed from the wafer and then exhausted through the holes(16). Therefore, water drops into which the fumes are condensed do not affect the wafer.
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