| 摘要 |
PROBLEM TO BE SOLVED: To provide a dip coating apparatus, of which the diameter of a coating vessel, the height of a vapor layer and the diameter of an opening part of coating vessel upper cap, through which a cylindrical substrate is passed freely adjustable, and which gives a uniform film thickness on the whole surface of a substrate. SOLUTION: A vapor layer height adjusting ring 5 and the coating vessel 6 are installed on a coating vessel receiving hole 2 and a coating vessel upper cap opening diameter adjusting disk 4 is installed on the coating vessel upper cap 1. The upper end of the coating vessel 6 is formed to be bevel-shaped so that the overflowed coating liquid flows gently and falls down to a liquid receiving pan 3. |
