| 摘要 |
PURPOSE: A chemical vapor deposition apparatus is provided to prevent process efficiency of the apparatus from being decreased by fine particles generated by the operation of a lift pin, by using vacuum pumping force so that the fine particles accumulated in a portion where the lift pin is installed are exhausted when the lift pin operates. CONSTITUTION: A heater block(110) is installed inside a chamber(100). A pumping unit vacuum-pumps the inside of the chamber. The lift pin(130) penetrates the heater block, capable of moving up and down. The lift pin supports the wafer inserted into the chamber and makes the wafer settled on the heater block. A cylinder(140) moves up and down the lift pin, installed in a side of the chamber. A cylinder case(150) is installed in a side of the chamber so that the lift pin and the cylinder are mounted on the cylinder case. An exhaust unit(200) connects the cylinder case with the pumping unit so that the fine particles in the cylinder case are exhausted by the pumping unit.
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