APPARATUS AND METHOD FOR REMOVING ALIEN SUBSTANCE OF LOAD LOCK CHAMBER

摘要

PURPOSE: An apparatus and a method for removing an alien substance of a load lock chamber are provided to prevent corrosion of a load lock chamber and contamination of a wafer by restricting a movement of reactants of a process chamber to a load lock chamber. CONSTITUTION: A gas injection hole(20) is formed at one side of a main body(11), namely at an inner wall of a door(12) within the main body(11). A gas heating portion(30) is formed between an outer side of the main body(11) and a rear side of the gas injection hole(20). A nitrogen gas is implanted into the gas injection hole(20) through the gas heating portion(30). A control portion(40) is used for controlling the gas heating portion(30) to handle a state of gas supply and a heating time. The temperature of the gas heated by the gas heating portion(30) is equal to the temperature of the process chamber. A gas supply valve(50) is controlled by the control portion(40).