| 摘要 |
PURPOSE: Provided are a photosensitive polymer which contains the sufficient content of silicon and shows reduced manufacturing cost, and which can provide an excellent lithographic property when used as a raw material of resist. CONSTITUTION: The photosensitive polymer consists of copolymer obtained by combining an acrylate or methacrylate monomer unit comprising a group represented by formula 1(wherein R1, R2 and R3 independently represent hydrogen atom, an alkyl group having C1-C4, an alkoxy group having C1-C4, a phenyl group, a benzyl group, a phenoxy group or -M(R'8), M is Si, Ge, Sn or OSi, and R' is an alkyl group having C1-C4, an alkoxyl group having C1-C4, a phenyl group or a phenoxy group), and a maleic anhydride monomer unit.
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