发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method capable of restraining a junction leak from occurring in a PN junction on the side of a chip and reducing the occurrence of dust when a semiconductor device equipped with PN junctions on the side of the chip is manufactured. SOLUTION: When a semiconductor device equipped with PN junctions J on the side of a chip 10 is manufactured, a semiconductor wafer is divided into the chips 10 by annealing their sides 13 with a laser beam 12.
申请公布号 JP2002184722(A) 申请公布日期 2002.06.28
申请号 JP20000377572 申请日期 2000.12.12
申请人 SONY CORP 发明人 HARADA KOICHI
分类号 H01L27/14;H01L21/301;(IPC1-7):H01L21/301 主分类号 H01L27/14
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