| 摘要 |
PROBLEM TO BE SOLVED: To realize a ultraviolet ray waveguide device capable of generating a micro spot of a ultraviolet ray. SOLUTION: A ultraviolet ray waveguide plate is manufactured by forming a SiO2 layer having a low refractive index which is oxidized at >=950 deg.C and a SiO2 layer having a high refractive index which is oxidized at <=900 deg.C in order on a silicon oxide substrate. A reflecting surface 14 such as being condensed at one spot (condensing spot 16) of the side of the device is formed by digging the SiO2 layer having the high refractive index by etching. Thus, intrasurface condensing is performed. An edge is formed at the condensing spot 16 so that the SiO2 layer having the high refractive index becomes the tip end side. Thus, condensing in the layer direction is performed. The ultraviolet ray is condensed at the condensing spot 16 by condensing in these both directions. The ultraviolet ray waveguide device 10 is used as a super high density optical memory recording/reading head. |
