发明名称 HEAT TREATMENT APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a heat treatment apparatus in which generation of particles or the like is suppressed by eliminating mechanical contacts in electrical wiring systems. SOLUTION: This heat treatment apparatus 22 is constituted such that a loading pedestal 58 having a built-in resistance heating means 60 is held rotatable by a rotary axis 44 in a treatment chamber 24, which can be evacuated to form a vacuum. A predetermined heat treatment is carried out on an object to be treated while the object is loaded on the rotating loading pedestal. A rotary contact means 46, inside of which an electrically conductive fluid is sealed for each electrical path, is provided in the rotary axis, and feeder lines 62 for the resistance heating means are installed via the rotary contact means. Mechanical contacts in electrical wiring systems are thereby eliminated, and generation of particles or the like is suppressed.</p>
申请公布号 JP2002222848(A) 申请公布日期 2002.08.09
申请号 JP20010016331 申请日期 2001.01.24
申请人 TOKYO ELECTRON LTD 发明人 SHA HAYASHI;RI KAZUNARI
分类号 H05B3/68;C23C14/50;C23C16/46;H01L21/205;H01L21/31;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 H05B3/68
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