发明名称 |
Circuit pattern inspection method and apparatus |
摘要 |
The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.
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申请公布号 |
US2002114506(A1) |
申请公布日期 |
2002.08.22 |
申请号 |
US20010791911 |
申请日期 |
2001.02.22 |
申请人 |
HIROI TAKASHI;WATANABE MASAHIRO;SHISHIDO CHIE;KUNI ASAHIRO;TANAKA MAKI;MIYAI HIROSHI;NARA YASUHIKO;NOZOE MARI |
发明人 |
HIROI TAKASHI;WATANABE MASAHIRO;SHISHIDO CHIE;KUNI ASAHIRO;TANAKA MAKI;MIYAI HIROSHI;NARA YASUHIKO;NOZOE MARI |
分类号 |
G01N23/225;G01N21/956;G06T1/00;G06T7/00;H01L21/66;(IPC1-7):G06K9/00;G06K9/62 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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