| 发明名称 |
Projection objection for microlithography |
| 摘要 |
The invention relates to a projection lens comprising a lens assembly that has at least one first narrowing of the group of light beams. A lens with a non-spherical surface is located in front of and/or behind the first narrowing.
|
| 申请公布号 |
US2002149855(A1) |
申请公布日期 |
2002.10.17 |
| 申请号 |
US20010760066 |
申请日期 |
2001.01.12 |
| 申请人 |
SCHUSTER KARL-HEINZ |
发明人 |
SCHUSTER KARL-HEINZ |
| 分类号 |
G02B13/24;G02B13/14;G02B13/18;G03F7/20;H01L21/027;(IPC1-7):G02B3/00;G02B9/00;G02B15/14;G02B17/00 |
主分类号 |
G02B13/24 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
