发明名称 SUBSTRATE HOLDING STRUCTURE AND SUBSTRATE PROCESSOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate holding structure which can inexpensively be manufactured and whose degree of freedom on design is large and which is superior in heat uniformity, and to provide a substrate processor using the structure. SOLUTION: The substrate holding structure holding a substrate at the time of processing the substrate in a chamber 2 is provided with a ceramic base 4 having an electric circuit 15 and holding the substrate, feeding conduction members 10a to 10d connected to the electric circuit 15 of the ceramic base 4, hermetic sealing members 11a to 11d which are arranged at the periphery of the feeding conduction members 10a to 10d and have one end parts connected to the ceramic base 4 and the other end parts connected to the sidewall of the chamber 2, and support members 5a and 5b supporting the ceramic substrate.</p>
申请公布号 JP2002313900(A) 申请公布日期 2002.10.25
申请号 JP20010113128 申请日期 2001.04.11
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NATSUHARA MASUHIRO;NAKADA HIROHIKO;HIIRAGIDAIRA HIROSHI
分类号 B01J19/00;B01J19/08;C23C16/458;C23C16/46;H01L21/205;H01L21/302;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 B01J19/00
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