发明名称 GAS TREATMENT DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent complication and large size and further high cost by regenerating the adsorption material 23 by a simpler structure in the gas treatment device using adsorption material (23). SOLUTION: The adsorption member (23), which adsorbs the treated content of the treated gas, is arranged between a needle shape or a line shape discharge electrode (21) and an opposing electrode (22) that is arranged for the discharge electrode (21) through a discharge space (D) with a prescribed distance from the discharge electrode (21), and is regenerated by the action of low temperature plasma that is generated by impressing a discharge voltage on the both electrodes (21, 22).</p>
申请公布号 JP2002343535(A) 申请公布日期 2002.11.29
申请号 JP20010150621 申请日期 2001.05.21
申请人 DAIKIN IND LTD 发明人 MOGI KANJI;TANAKA TOSHIO;KAGAWA KENKICHI
分类号 A61L9/16;A61L9/22;B01D53/04;B01J19/08;B01J20/34;H01T19/04;(IPC1-7):H01T19/04 主分类号 A61L9/16
代理机构 代理人
主权项
地址