| 摘要 |
<p>PROBLEM TO BE SOLVED: To enhance the efficiency of an operation by constructing a system whose operation is not stopped frequently due to the operation of a safety device, by receiving strong scattered light from a comparatively large foreign substance or the like when a high-sensitivity CCD camera is operated in a scanning electron microscope equipped with the high-sensitivity CCD camera which performs a laser defect detection. SOLUTION: The automatic CCD camera changeover system in the scanning electron microscope equipped with a laser defect detecting function is used in the scanning electron microscope for wafer surface observation. The system is equipped with a laser optical system by which the position of a defect is irradiated with a laser from the oblique upper part, and an optical microscope which observes scattered light from the defect. The high-sensitivity CCD camera and a standard-type CCD camera are attached to the optical microscope, its optical axis is positioned on the basis of preliminarily measured defect position information, and the defect is observed by the standard CCD camera at the optical microscope. The standard CCD camera is changed over to the high-sensitivity CCD camera when the defect cannot be observed with the standard CCD camera and the defect is observed.</p> |
