发明名称 METHOD OF MANUFACTURING ARRAY SUBSTRATE OF DISPLAY UNIT
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of manufacturing an array substrate, where display nonuniformity is prevented from occurring without deteriorating the characteristics of a TFT. SOLUTION: A semiconductor film whose hydrogen concentration is 8 at.% or above is formed as the semiconductor film 36 of a thin film transistor 20, and then a pixel electrode 28 electrically connected to the source electrode of the thin film transistor 20 is formed by the use of an amorphous transparent conductive film. In succession, the semiconductor film and the pixel electrode are subjected to annealing to turn the pixel electrode crystalline from an amorphous state. Annealing is carried out under the condition that an increase rate of hydrogen concentration around the interface of a semiconductor film amounts to 20% or below after annealing.</p>
申请公布号 JP2003017707(A) 申请公布日期 2003.01.17
申请号 JP20010202487 申请日期 2001.07.03
申请人 TOSHIBA CORP;INTERNATL BUSINESS MACH CORP <IBM> 发明人 KUBO AKIRA;OKAJIMA KENJI
分类号 G02F1/1368;G09F9/00;G09F9/30;G09F9/35;H01L21/336;H01L29/786;(IPC1-7):H01L29/786;G02F1/136 主分类号 G02F1/1368
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