摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of manufacturing an array substrate, where display nonuniformity is prevented from occurring without deteriorating the characteristics of a TFT. SOLUTION: A semiconductor film whose hydrogen concentration is 8 at.% or above is formed as the semiconductor film 36 of a thin film transistor 20, and then a pixel electrode 28 electrically connected to the source electrode of the thin film transistor 20 is formed by the use of an amorphous transparent conductive film. In succession, the semiconductor film and the pixel electrode are subjected to annealing to turn the pixel electrode crystalline from an amorphous state. Annealing is carried out under the condition that an increase rate of hydrogen concentration around the interface of a semiconductor film amounts to 20% or below after annealing.</p> |