| 发明名称 | Manufacturing method of organic semiconductor film, organic semiconductor film, thin film transistor, active matrix device, electro-optical device, and electronic device | ||
| 摘要 | A manufacturing method of an organic semiconductor film according to the invention includes applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern, applying a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent onto a region of the base material having the liquid composition applied thereto, and removing the second solvent. | ||
| 申请公布号 | US9484538(B2) | 申请公布日期 | 2016.11.01 |
| 申请号 | US201514629288 | 申请日期 | 2015.02.23 |
| 申请人 | Seiko Epson Corporation | 发明人 | Moriya Soichi |
| 分类号 | H01L51/00;H01L51/05;H01L51/50 | 主分类号 | H01L51/00 |
| 代理机构 | ALG Intellectual Property, LLC | 代理人 | ALG Intellectual Property, LLC |
| 主权项 | 1. A manufacturing method of an organic semiconductor film, comprising: applying a liquid composition in which an organic semiconductor material is dissolved or dispersed in a first solvent onto a base material in a predetermined pattern; removing the first solvent; applying, after the removing of the first solvent, a second solvent in which solubility of the organic semiconductor material is lower than that in the first solvent into a region of the base material having the liquid composition applied thereto; and removing the second solvent. | ||
| 地址 | Tokyo JP | ||