发明名称 SEMICONDUCTOR STORAGE ELEMENT, SEMICONDUCTOR DEVICE AND METHOD FOR CONTROLLING THE SAME
摘要 PURPOSE: To solve the problem that since a semiconductor flash memory required for high reliability must output and input electrons through an oxide film obtained by directly oxidizing a silicon substrate, a using voltage becomes large from positive to negative. CONSTITUTION: High reliability is realized by storing a charge in regions divided into a plurality. A migration of the electrons is performed through the oxide film or the like by not only the oxide film obtained by directly thermally oxidation of the substrate having high reliability with the high reliability as a background but also through the oxide film or the like deposited via a CVD, and hence controlled by potentials of the same polarity at the time of writing and erasing information.
申请公布号 KR20030017303(A) 申请公布日期 2003.03.03
申请号 KR20020010592 申请日期 2002.02.27
申请人 HITACHI, CO., LTD. 发明人 ISHII TOMOYUKI;OSABE TARO
分类号 H01L21/8247;G11C16/04;H01L21/28;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L27/115;H01L21/824 主分类号 H01L21/8247
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