ALIGNER AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an aligner which enables exposure under the optimum illumination condition, without depending on the directivity of fine pattern on a reticle. SOLUTION: The aligner is provided with an illumination optical system (1-7) for illuminating the reticle (R), in which a pattern to be transferred is formed, and a projection optical system (PL) for forming an image of the pattern of the reticle on a substrate (W). The illumination optical system has a pupil-shape forming means (6) for forming four practical surface light sources on the pupil surface or the surface in the vicinity of the pupil surface. In order to make a resist pattern to be transferred or a substrate pattern to be formed via passing process have a desired size and form, the formation means (6) sets the position coordinates of the longitudinal direction of the four practical surface light sources to be made practically different from the position coordinates in the traversal direction.