发明名称 ELECTROLESS PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electroless plating method which does not need roughening treatment by chemicals, when electroless-plating a resin substrate which incorporates a plating catalyst. SOLUTION: This method is characterized by forming mechanical recesses on the resin substrate which incorporates the plating catalyst, before electroless plating it, and making the recesses have a shape like a wedge or a hole, depths of about 10μm, and distances among the recesses of about 50μm.
申请公布号 JP2003073844(A) 申请公布日期 2003.03.12
申请号 JP20010268417 申请日期 2001.09.05
申请人 HITACHI CABLE LTD 发明人 SAGAWA HIDEYUKI;WASHIMI TORU;SATO AKIRA
分类号 C23C18/20;C23C18/16;H05K3/18;(IPC1-7):C23C18/20 主分类号 C23C18/20
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