| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for forming a polymer thin film by which decrease in the bias voltage (current) due to increase in the resistance loss is suppressed to prevent irregular deposition of a film, the polymer thin film having uniform thickness is stably formed and the yield can be improved. SOLUTION: The method includes a process of irradiating a substrate having a conductive film and a photosemiconductor film with light to deposit a film in the irradiated region, while the substrate is disposed to be energized in a electrodeposition liquid containing a polymer material whose solubility or dispersibility decreases by changes in the pH. The square or rectangular minimum region which encloses the all of a plurality of irradiation regions irradiated with light at a time has a side line L which is the side line of the maximum square in the minimum region and satisfies the condition of L <L0×[(v/v0 )/((i/ i0 )×(R/R0 ))]<1/2> , wherein L is the side line (m) of the square, i is the current density (A/m<2> ), v is the bias voltage (V), R is the resistance (Ω/unit square), and L0 , v0 , i0 and R0 are constants. Preferably a feeder terminal is disposed in the conductive film near the minimum region and the substrate is irradiated with light while the bias voltage is applied.</p> |
