GAS-SEPARATED CATALYST CVD SYSTEM, PHOTOELECTRIC CONVERSION DEVICE MANUFACTURED BY USING THE SYSTEM, AND METHOD OF MANUFACTURING THE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a catalyst CVD system that can uniformly form an Si- based thin film in a high quality and large area at a high speed, and to provide a photoelectric conversion device manufactured by using the CVD system and a method of manufacturing the conversion device. SOLUTION: The catalyst CVD system forms the Si-based thin film on a substrate by blowing out a hydrogen gas and an Si-based gas from a shower plate having a plurality of gas blowing-out holes. The introducing route of the hydrogen gas is separated from that of the Si-based gas until the route passes through the shower plate. In addition, a thermal catalyzer connected to a DC power source and having an active hydrogen density adjusting function and a heat radiation reducing structure is installed to the hydrogen gas introducing route on the upstream side of the shower plate. Moreover, the distance between the adjacent two gas blowing-out holes of the shower plate is made shorter than that between the shower plate and substrate.