| 摘要 |
PURPOSE: A mass analyzer of semiconductor device ion implanter equipment is provided to prevent a damage to a chamber by covering an exposed inner wall of the chamber when impurity ions are separated in an unspecified direction. CONSTITUTION: At least one plate is coupled to the chamber(40), capable of being disassembled or assembled in response to the transfer path of the ions transformed by a magnetic field. A liner(32a,32b,32c) absorbs the ions separated from the transfer path, installed in the center of the inner surface in the upward, downward, right and left directions of the chamber. An assistant cover(42b) covers the inner wall of the chamber exposed to the liner.
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