发明名称 |
CHEMICAL SUPPLY SYSTEM OF EQUIPMENT FOR FABRICATING SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: A chemical supply system of equipment for fabricating a semiconductor device is provided to easily supply quantitative chemical and maintain a stable supply of the chemical by previously detecting whether air bubbles exist in the chemical flowing from a chemical supply unit to a process chamber and by controlling the variety and fluidity of pressure supplied. CONSTITUTION: A chemical supply line is connected from the chemical supply unit(10) to the process chamber(18). A plurality of valves(19) are installed in the chemical supply line. A pump(12) supplies the pressure of the chemical, connected to the chemical supply line. A filter(14) inductively exhausts the particles and air bubbles contained in the chemical, connected to the chemical supply line. At least one air bubble detecting sensor(20) detects the existence of air bubbles in the chemical, connected to the chemical supply line. A controller receives the signal from the air bubble detecting sensor and controls the induced exhaust of the air bubbles filtered by the pump and the filter of the chemical supply line.
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申请公布号 |
KR20030032427(A) |
申请公布日期 |
2003.04.26 |
申请号 |
KR20010064191 |
申请日期 |
2001.10.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HAN, GWANG YUN |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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