发明名称 POSITIONING DEVICE, EXPOSURE SYSTEM, AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To realize a wavelength correction of high accuracy by a laser interferometer so as to position a stage very accurately. SOLUTION: A positioning device is equipped with laser interferometers 111 and 112 as a plurality of position measuring means which measure the positions of movable stages 103 and 106 in an X direction as a first direction of movement, a specific laser interferometer is selected out of the laser interferometers 111 and 112 in the X direction on the basis of the positions of the stages 103 and 106 in a Y direction vertical to the X direction, the positions of the stages 103 and 106 are measured by the use of the specific laser interferometer selected from the interferometers 111 and 112, and measurement correction is made by the other laser interferometer as a measurement correction means. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178957(A) 申请公布日期 2003.06.27
申请号 JP20010378817 申请日期 2001.12.12
申请人 CANON INC 发明人 YAMAZAKI TOSHIHIRO
分类号 G01B11/00;G01B21/00;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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