发明名称 DEVELOPING METHOD AND APPARATUS FOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus, in which when slit scan development slit scan rinsing is performed, even if a rinse solution discharge nozzle is separated from the upper surface of a substrate and is moved horizontally, the rinse solution discharged from a slit-shaped discharge outlet is prevented from turning into shower. SOLUTION: A rinse solution 2 is discharged from a slit-shaped discharge outlet, in a state where the slit-shaped discharge outlet 18 of a rinse solution discharge nozzle is dipped in a rinse solution 16; the slit-shaped discharge outlet is exposed from the rinse solution, while discharging the rinse solution from the slit-shaped discharge outlet; and then the discharge of the rinse solution onto the substrate by the rinsed solution discharge nozzle is started. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003203851(A) 申请公布日期 2003.07.18
申请号 JP20020002080 申请日期 2002.01.09
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HARUMOTO MASAHIKO;SANADA MASAKAZU
分类号 G03F7/30;B05B1/04;B05C5/02;B05C11/10;B05D1/26;B05D1/34;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/30
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