| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing reflecting devices for photonics application which has high reflection quality. SOLUTION: The method for manufacturing the electromagnetic radiation reflecting devices (23) comprises the steps of: (a) providing a silicon substrate (1) defined by at least one first free surface (2), (b) forming on the first surface a layer of protective material provided with an opening which exposes a region of the first free surface (2), (c) etching the region of the free surface (2) by means of an anisotropic agent to remove at least one portion of the substrate and defining a second free surface (16) of the substrate inclined in relation to the first surface. Furthermore, the first free surface (2) is parallel to the crystalline planes ä110} of silicon substrate and the step (c) comprises a progressing step of the anisotropic agent so that the second free surface (16) resulting from the etching step is parallel to the planes ä100} of the substrate (1). COPYRIGHT: (C)2003,JPO |
