Plasma-type X-ray generators encased in vacuum chambers exhibiting reduced heating of interior components, and microlithography systems comprising same

摘要

X-ray generators are disclosed that produce X-ray radiation from a plasma and that exhibit reduced heating of certain components caused by proximity to the plasma. An embodiment of such an X-ray generator is encased in a vacuum chamber that exhibits reduced reflection and scattering of electromagnetic radiation from the inner walls thereof to components contained in the chamber. Since less reflected radiation reaches the components, the components experience less temperature increase during use. For example, the inner walls can be coated with a film of carbon black that absorbs incident radiation from infrared to ultraviolet.