发明名称 Process for forming hydrogen silsesquioxane resins
摘要 Herein disclosed is a method for preparing a siloxane resin comprising HSiO3/2 siloxane units and containing silicon-bonded hydroxy groups in a range from 1 to 40 mole percent, which comprises: (A) combining an alkoxysilane of the formula HSi(OR)3 wherein R is selected from the group consisting of alkyl groups having 1 to 6 carbon atoms, water, an effective amount of an acid catalyst, and a first solvent, to form a reaction solution; and (B) reacting the reaction solution for a time and temperature sufficient to form the siloxane resin containing an alcohol. Also disclosed is a method for improving performance of a siloxane resin comprising HSiO3/2 siloxane units and containing silicon-bonded hydroxy groups in a range from about 1 mole percent to about 40 mole percent, comprising: (A) providing a siloxane resin solution comprising the siloxane resin, water, an acid catalyst, a first solvent, and an alcohol; (B) adding a second solvent having a boiling point higher than the first solvent; and (C) removing the water, acid catalyst, alcohol and first solvent. The resin produced by the disclosed method is useful in a method of forming an insoluble coating on a substrate, such as an electronic device.
申请公布号 US2003152784(A1) 申请公布日期 2003.08.14
申请号 US20020060558 申请日期 2002.01.30
申请人 DEIS THOMAS A.;GRIGORAS STELIAN;SPAULDING MICHAEL J. 发明人 DEIS THOMAS A.;GRIGORAS STELIAN;SPAULDING MICHAEL J.
分类号 C08G77/12;C08G77/16;(IPC1-7):B32B9/04 主分类号 C08G77/12
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